Mikrokomputerowy system sterowania przemysłową linią próżniową do nanoszenia cienkich warstw metodą jonowego rozpylania magnetronowego

The paper presents a description of a microcomputer control system for an industrial, technological equipment for thin film deposition by means of the ion sputtering method. The construction of the vacuum part of the equipment as well as supply and controlling system is presented. Computer program with different working modes of the system and the methods of controlling such system parameters like the sputtering current, transport velocity of the substrates, pressure of the working gas and substrate temperature.