On Trap Generation in SiO$\text{}_{2}$ Films of Si MOSFETS by Hot Electrons

Trap generation in amorphous SiO$\text{}_{2}$ films with thickness about 500 Å was studied by nonavalanche injection of hot electrons. The trap density, the electron capture cross-section of native and generated traps and the effective trap generation constant for the oxide fields of 1-4 MV/cm, injected charge density up to 3 × 10$\text{}^{19}$ e/cm$\text{}^{-2}$ and injected current density in the range 2-300 μA/cm$\text{}^{2}$ were determined and discussed.